JPH0745564Y2 - サセプタ - Google Patents
サセプタInfo
- Publication number
- JPH0745564Y2 JPH0745564Y2 JP1989097840U JP9784089U JPH0745564Y2 JP H0745564 Y2 JPH0745564 Y2 JP H0745564Y2 JP 1989097840 U JP1989097840 U JP 1989097840U JP 9784089 U JP9784089 U JP 9784089U JP H0745564 Y2 JPH0745564 Y2 JP H0745564Y2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- susceptor
- ventilation groove
- present
- contact surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000009423 ventilation Methods 0.000 claims description 12
- 238000000034 method Methods 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1989097840U JPH0745564Y2 (ja) | 1989-08-21 | 1989-08-21 | サセプタ |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1989097840U JPH0745564Y2 (ja) | 1989-08-21 | 1989-08-21 | サセプタ |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0338357U JPH0338357U (en]) | 1991-04-12 |
JPH0745564Y2 true JPH0745564Y2 (ja) | 1995-10-18 |
Family
ID=31646966
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1989097840U Expired - Lifetime JPH0745564Y2 (ja) | 1989-08-21 | 1989-08-21 | サセプタ |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0745564Y2 (en]) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100583944B1 (ko) * | 1999-11-12 | 2006-05-26 | 삼성전자주식회사 | 상압 화학 기상 증착 공정용 서셉터 |
JP2018182290A (ja) * | 2017-04-18 | 2018-11-15 | 日新イオン機器株式会社 | 静電チャック |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5269578A (en) * | 1975-12-08 | 1977-06-09 | Hitachi Ltd | Wafer suscepter |
JPS5972127A (ja) * | 1982-10-18 | 1984-04-24 | Toshiba Corp | 気相成長用溝切り熱板 |
-
1989
- 1989-08-21 JP JP1989097840U patent/JPH0745564Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH0338357U (en]) | 1991-04-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |